Enroll Course: https://www.coursera.org/learn/optical-and-x-ray-characterization
The ‘Optical and X-Ray Characterization’ course on Coursera offers an in-depth exploration into the essential techniques used in the analysis of semiconductor thin films. This course is ideal for students, researchers, and industry professionals interested in understanding how optical and X-ray methods can be applied to measure film properties such as thickness, purity, crystalline quality, and composition.
One of the highlights of this course is its comprehensive syllabus, which covers a range of modern, non-destructive techniques. Starting with reflectance spectroscopy, students learn how to rapidly assess transparent material thicknesses without damaging the sample. The course then delves into ellipsometry, a sophisticated method that enables the determination of nanometer-scale layer thicknesses and refractive indices—crucial for advanced semiconductor device fabrication.
Further topics include photoluminescence, a technique that provides insight into electronic properties, and electron microprobe X-ray analysis, which allows for detailed elemental analysis at microscopic scales. Each module combines theoretical foundations with real-world applications, offering a balanced and practical learning experience.
The course culminates in a hands-on project where learners analyze X-ray images from a 40 nm MOSFET, synthesizing their knowledge to perform a detailed compositional assessment. This practical approach enhances understanding and prepares learners to apply these techniques directly in research or industrial settings.
I highly recommend this course for anyone looking to deepen their understanding of material characterization methods, especially those working in or studying the semiconductor industry. Its clear explanations, current techniques, and real-world relevance make it a valuable resource for advancing your skills in material analysis.
Enroll Course: https://www.coursera.org/learn/optical-and-x-ray-characterization